The Company

Iosil Energy Corporation was founded in 2007. Its Research and Development facilities were located in the National Institute for Nanotechnology in Edmonton, Alberta. Iosil developed and patented a breakthrough technology for the production of high purity virgin polysilicon and attracted investment capital to finance the development of a pilot scale manufacturing process.

Highlights:

• Proven 7N Polysilicon Purity
• Superior Cost Structure
• Proven Ability to Recover Silicon from Wafer Saw Kerf Waste
• Up to 90% Less Electricity Use Over Current Technology
• Lowers Carbon Footprint of Silicon Manufacturing
• Much Less CAPEX than Current Technology – Superior ROI

Iosil has demonstrated its ability to produce high-purity solar grade polysilicon from the waste material (or “kerf”) created by wafer sawing operations, a market opportunity where there is no competition.

In 2010, the company established a Pilot Manufacturing Plant in Columbus, Ohio for the first commercial scale demonstration of its process.